[12a-PB3-1~16] 13.4 Si processing /Si based thin film / MEMS / Equipment technology

[12a-PB3-15] Patterning of BN Film Using Dry Etching Methods

〇Takayuki Matsuda¹, Masao Noma², Michiru Yamashita³, Shigehiko Hasegawa⁴, Keiichiro Urabe⁵, Koji Eriguchi⁵, Sang-Seok Lee¹ (1.Tottori Univ., Graduate School of Engineering, 2.SHINKO SEIKI., 3.Hyogo Prefectural Institute of Technology, 4.Osaka Univ., 5.Kyoto Univ.)

Keywords:MEMS Switch, Boron Nitride Film