[12a-PB3-1~16] 13.4 Si processing /Si based thin film / MEMS / Equipment technology

[12a-PB3-3] Development of Poly-Si Formation Method on Glass Substrate by Using Hydrogen Radical Heating

〇Hiroki Nakaie¹, Shingo Saito¹, Tetsuji Arai¹, Kazuki Kamimura¹, Keisuke Arimoto¹, Kousuke Hara¹, Junji Yamanaka¹, Kiyokazu Nakagawa¹, Toshiyuki Takamatsu², Kentarou Sawano³ (1.Univ. of Yamanashi, 2.SST Inc., 3.Tokyo City Univ.)

Keywords:Poly-Si, hydrogen radical