[12a-PB3-1~16] 13.4 Si processing /Si based thin film / MEMS / Equipment technology

[12a-PB3-7] 1 atomic-percent-resolution STEM-EELS analysis of boron impurity distribution in crystalline Si nano-region

〇Takanori Asano¹, Riichiro Takaishi¹, Hiroki Tanaka¹, Hidenori Miyagawa¹, Masumi Saitoh¹ (1.Toshiba Memory Corp.)

Keywords:Silicon, Boron, STEM-EELS