[12a-W641-1~14] 8.2 Plasma deposition of thin film, plasma etching and surface treatment

[12a-W641-2] Deposition of particles generated in silane plasmas under high gas velocity and their influence on qualities of deposited films

Kazuma Tanaka¹, LIu Shi¹, Hisayuki Hara¹, Shota Nagaishi¹, Daisuke Yamashita¹, Kunihiro Kamataki¹, Naho Itagaki¹, 〇Kazunori Koga^1,2, Masaharu Shiratani¹ (1.Kyushu Univ,, 2.NINS)

Keywords:plasma CVD, a-Si:H, Higher order silane