9:15 AM - 9:30 AM
[12a-W641-2] Deposition of particles generated in silane plasmas under high gas velocity and their influence on qualities of deposited films
Keywords:plasma CVD, a-Si:H, Higher order silane
Oral presentation
8 Plasma Electronics » 8.2 Plasma deposition of thin film, plasma etching and surface treatment
Tue. Mar 12, 2019 9:00 AM - 12:45 PM W641 (W641)
Keigo Takeda(Meijo Univ.), Haruka Suzuki(Nagoya Univ.)
9:15 AM - 9:30 AM
Keywords:plasma CVD, a-Si:H, Higher order silane