12:00 PM - 12:15 PM
[9a-S421-12] Fabrication of High-Sensitivity Silicon Nanowire Biosensor by Electron Beam Lithography and Detection of Antigen-Antibody Specific Binding at Attomolar Concentration
Keywords:Silicon Nanowire Biosensor, Electron Beam Lithography, Antigen-Antibody Specific Binding
A simple top-down fabrication process of silicon nanowire (SiNW) biosensor by electron beam lithography was investigated. To achieve ultra-sensitive detection of attomolar (aM) level, several crucial parameters of the biosensor were optimized, for instance, controlling impurity doping concentration, miniaturizing SiNW width, functionalizing SiNW surface using 2-aminoethylphosphonic acid coupling. On the basis of precise process control, SiNW with width of 16.2 nm was successfully fabricated. The performance of the SiNW biosensor was evaluated through detecting antigen-antibody specific binding. It was demonstrated that the SiNW biosensor has the ability to detect specific biomolecules with concentration of 6 aM. The limit of detection was over 300 times higher than that of the current reported SiNW biosensors.