Stress Evaluation of Plasma CVD Deposited SiN and a-C Films using Raman Spectroscopy

Presentation information

Oral presentation

13 Semiconductors » 13.4 Si processing /Si based thin film / MEMS / Equipment technology

Sat. Mar 9, 2019 1:15 PM - 3:45 PM M114 (H114)

Yasuo Cho(Tohoku Univ.), Wenchang Yeh(Shimane Univ.)

3:30 PM - 3:45 PM

〇Masato Koharada¹, Ryo Yokogawa^1,2, Atsushi Ogura¹ (1.Meiji Univ., 2.JSPS Research Fellow DC)

Keywords:Raman Spectroscopy