Masato Koharada

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Speaker, Author, Co-Author

Sat. Mar 9, 2019 1:15 PM - 3:45 PM M114 (H114)

Oral presentation
| 13 Semiconductors
| 13.4 Si processing /Si based thin film / MEMS / Equipment technology

[9p-M114-1~10] 13.4 Si processing /Si based thin film / MEMS / Equipment technology

3:30 PM - 3:45 PM

[9p-M114-10] Stress Evaluation of Plasma CVD Deposited SiN and a-C Films using Raman Spectroscopy

〇Masato Koharada¹, Ryo Yokogawa^1,2, Atsushi Ogura¹ (1.Meiji Univ., 2.JSPS Research Fellow DC)