The 66th JSAP Spring Meeting, 2019

Presentation information

Oral presentation

21 Joint Session K "Wide bandgap oxide semiconductor materials and devices" » 21.1 Joint Session K "Wide bandgap oxide semiconductor materials and devices"

[9p-S011-1~13] 21.1 Joint Session K "Wide bandgap oxide semiconductor materials and devices"

Sat. Mar 9, 2019 1:45 PM - 5:15 PM S011 (South Lecture Bldg.)

Yukiharu Uraoka(NAIST), Takayoshi Oshima(Saga Univ.)

2:00 PM - 2:15 PM

[9p-S011-2] Analysis of IGZO crystalline region stability by first principles calculation

Tomonori Nakayama1, Masahiro Takahashi1, Tomosato Kanagawa1, Toshimitsu Obonai1, Kenichi Okazaki1, Shunpei Yamazaki1 (1.SEL)

Keywords:oxide semiconductor, IGZO, ab initio calculation

In this study, we derived an IGZO model including a crystalline region from first principles calculations in the following manner, and analyzed its stability. As an initial structure, we arranged a crystalline region in the center and an amorphous region in the periphery. With this structure, we performed quantum molecular dynamics calculations while fixing the crystalline region, followed by optimization of the whole structure. The resulting IGZO model including the crystalline region had a lower energy than an amorphous IGZO model, indicating that the presence of the crystalline region contributes to stabilization.