[9p-S223-1~12] 7.3 Micro/Nano patterning and fabrication

[9p-S223-1] Investigation on Optics for Printing Large Patterns Using Maskless Inside Lithography

〇Toshiyuki Horiuchi¹, Kousuke Akitani¹, Kazumi Imahashi¹, Yuta Suzuki¹, Jun-ya Iwasaki¹, Akira Yanagida¹, Hiroshi Kobayashi¹ (1.Tokyo Denki Univ.)

Keywords:inside lithography, optical fiber array, taper conduit

An exposure system for forming large patterns with widths of 300 µm on inside surfaces of pipes with inner diameter of 10 mm and length or depth of 300 mm was aimed. It was decided to supply exposure light using optical fibers arrayed in a line, deformed in 500-µm square shape, and contacted densely. The fiber-array end was contacted to a taper conduit, and the exposure light distribution corresponding to patterns was transferred to the other end of the conduit by a reduction ratio of 1/2.25. In addition, an image of the taper-conduit exit was made using a convex lens and a 45° mirror reflecting the light in the direction in perpendicular to the pipe wall. This optical setup was tested by printing patterns on silicon wafers using one of the fibers in the array. It was confirmed that 300-µm wide linear space patterns were printable.