3:15 PM - 3:30 PM
△ [9p-W323-8] Experimental study of dual-frequency CCP characteristics
Keywords:dual-frequency CCP, plasma density, self-bias potential
Oral presentation
8 Plasma Electronics » 8.1 Plasma production and diagnostics
Sat. Mar 9, 2019 1:30 PM - 6:00 PM W323 (W323)
Hiroshi Akatsuka(Tokyo Tech), Tsuyohito Ito(東大)
3:15 PM - 3:30 PM
Keywords:dual-frequency CCP, plasma density, self-bias potential