Kohei Nishimura

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Speaker, Author, Co-Author

Thu. Sep 10, 2020 9:00 AM - 11:00 AM Z03

Oral presentation
| 8 Plasma Electronics
| 8.2 Plasma deposition of thin film, plasma etching and surface treatment

[10a-Z03-1~8] 8.2 Plasma deposition of thin film, plasma etching and surface treatment

10:30 AM - 10:45 AM

[10a-Z03-7] Reduction of MWCNTs wall thickness by plasma treatment

〇Kohei Nishimura¹, Daisuke Ogawa¹, Keiji Nakamura¹, Hideo Uchida¹ (1.Chubu Univ.)