Oral presentation

8 Plasma Electronics » 8.2 Plasma deposition of thin film, plasma etching and surface treatment

[10a-Z03-1~8] 8.2 Plasma deposition of thin film, plasma etching and surface treatment

Thu. Sep 10, 2020 9:00 AM - 11:00 AM Z03

△：Presentation by Applicant for JSAP Young Scientists Presentation Award
▲：English Presentation
▼：Both of Above
No Mark：None of Above

9:00 AM - 9:15 AM

[10a-Z03-1] Generation of powder from liquid raw material using atmospheric pressure plasma

Momoyo Takahashi¹, Youki Ohkubo¹, Takayuki Kitagawa¹, Kazuyuki Noborio¹, 〇Kohshi Taguchi^1,2 (1.Sakigake-S Co., Ltd., 2.Checkers Co., Ltd.)

9:15 AM - 9:30 AM

〇Shinya Ueno¹, Kazuyuki Noborio², Koshi Taguchi^1,2 (1.Sakigake-S Co., Ltd., 2.SAKIGAKE Co., Ltd)

9:30 AM - 9:45 AM

〇Takayuki Kobayashi¹, Masayuki Nakamura¹, Toshiaki Tatsuta¹, Shin-ichi Motoyama¹ (1.Samco)

9:45 AM - 10:00 AM

〇Ginga Sato¹, Takeshi Kitajima¹, Toshiki Nakano¹ (1.National Defense Aca)

10:00 AM - 10:15 AM

〇Hiroshi Okawa¹, Shiki Sato¹, Tetsuya Akitsu^2,1 (1.HSU, 2.Yamanashi Univ.)

10:15 AM - 10:30 AM

〇HU LI¹, Kouji Inagaki², Yoshitada Morikawa² (1.TEL Technology Solutions, 2.Osaka Univ.)

10:30 AM - 10:45 AM

〇Kohei Nishimura¹, Daisuke Ogawa¹, Keiji Nakamura¹, Hideo Uchida¹ (1.Chubu Univ.)

10:45 AM - 11:00 AM

〇(M1)Koichi Ishii¹, Shin Ogawa¹, Akinori Oda¹ (1.ChibaTech.)