Koichi Ishii

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Speaker, Author, Co-Author

Thu. Sep 10, 2020 9:00 AM - 11:00 AM Z03

Oral presentation
| 8 Plasma Electronics
| 8.2 Plasma deposition of thin film, plasma etching and surface treatment

[10a-Z03-1~8] 8.2 Plasma deposition of thin film, plasma etching and surface treatment

10:45 AM - 11:00 AM

[10a-Z03-8] Numerical Analysis of Input-Power Dependence of DLC Film Deposition Process by Low-Pressure and Radio Frequency Ar/CH₄ plasma-enhanced CVD

〇(M1)Koichi Ishii¹, Shin Ogawa¹, Akinori Oda¹ (1.ChibaTech.)