Masaya Hayashi

→ Search for Masaya Hayashi in Google Scholar

Speaker, Author, Co-Author

Thu. Sep 10, 2020 1:15 PM - 6:00 PM Z23

Oral presentation
| 15 Crystal Engineering
| 15.6 Group IV Compound Semiconductors (SiC)

[10p-Z23-1~16] 15.6 Group IV Compound Semiconductors (SiC)

2:15 PM - 2:30 PM

[10p-Z23-5] Rapid Cleaning of SiC CVD Reactor Using ClF₃ Gas

〇Masaya Hayashi¹, Takumi Mamyouda¹, Hitoshi Habuka¹, Akio Ishiguro², Shigeaki Ishii², Yoshiaki Daigo², Hideki Ito², Ichiro Mizushima², Yoshinao Takahashi³ (1.Yokohama Nat. Univ, 2.NuFlare Technology, 3.KANTO DENKA KOGYO)