Hiroyuki Tanaka

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Speaker, Author, Co-Author

Wed. Sep 9, 2020 8:30 AM - 11:30 AM Z10

Oral presentation
| 13 Semiconductors
| 13.4 Si processing /Si based thin film / MEMS / Equipment technology

[9a-Z10-1~11] 13.4 Si processing /Si based thin film / MEMS / Equipment technology

9:15 AM - 9:30 AM

[9a-Z10-4] A Consideration on Operating Pressure in Minimal μ-Plasma Etching Process

〇Hiroyuki Tanaka¹, Shunichirou Shinbori^2,3, Chikatsu Iwase^2,3, Sommawan Khumpuang^1,2, Shiro Hara^1,2 (1.AIST, 2.MINIMAL, 3.SUNYOU)