Mickael Lozach

→ Search for Mickael Lozach in Google Scholar

Speaker, Author, Co-Author

Wed. Sep 9, 2020 8:30 AM - 11:30 AM Z10

Oral presentation
| 13 Semiconductors
| 13.4 Si processing /Si based thin film / MEMS / Equipment technology

[9a-Z10-1~11] 13.4 Si processing /Si based thin film / MEMS / Equipment technology

10:00 AM - 10:15 AM

▲ [9a-Z10-6] Consideration of relationship between the variation of Gate Oxide Thicknesses and the
density of interface states for MOS structure

〇Mickael Lozach¹, Sommawan Khumpuang^1,2, Shiro Hara^1,2 (1.AIST, Device Technology Research Institute, Minimal System Group, Tsukuba, 2.Minimal Fab Promoting Organization, AIST, Tsukuba)