[11p-Z03-1~2] 8.8 Plasma Electronics Award Speech

Fri. Sep 11, 2020 12:30 PM - 1:30 PM Z03

△：Presentation by Applicant for JSAP Young Scientists Presentation Award
▲：English Presentation
▼：Both of Above
No Mark：None of Above

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12:30 PM - 1:00 PM

[11p-Z03-1] [Plasma Electronics Award Speech] Insights into etching properties of atomic layer etching process for dielectric films

〇Nobuyuki Kuboi¹ (1.Sony semiconductor solutions corporation)

1:00 PM - 1:30 PM

[11p-Z03-2] [Plasma Electronics Award Speech] Formation mechanism of sidewall striation in high-aspect-ratio hole etching

〇Mitsuhiro Omura¹, Junichi Hashimoto¹, Takahiro Adachi¹, Yusuke Kondo¹, Masao Ishikawa¹, Junko Abe¹, Itsuko Sakai¹, Hisataka Hayashi¹, Makoto Sekine², Masaru Hori² (1.Kioxia, 2.Nagoya Univ.)

Sessions

8 Plasma Electronics » 8.8 Plasma Electronics Award Speech

[11p-Z03-1~2] 8.8 Plasma Electronics Award Speech

[11p-Z03-1] [Plasma Electronics Award Speech] Insights into etching properties of atomic layer etching process for dielectric films

[11p-Z03-2] [Plasma Electronics Award Speech] Formation mechanism of sidewall striation in high-aspect-ratio hole etching

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