[10a-Z05-1~11] 6.4 Thin films and New materials

[10a-Z05-9] Characterization of nickel oxide thin films prepared by low temperature sputter deposition using water vapor injection into substrate and target surface

〇Masaki Kataoka¹, Yoshio Abe¹, Midori Kawamura¹, Kyung Ho Kim¹, Takayuki Kiba¹ (1.Kitami Inst. Technol)

Keywords:electrochromic, nickel hydroxide

In this study, we investigated the effects of the direction of water vapor injection and the substrate temperature on the deposition rate, composition, and EC characteristics of nickel oxide thin films. The substrate temperarure were -80°C and -170°C. And H₂O was injected onto the substrate or target surface. It was found that nickel oxide fabricate thin films with different compositions were formed by changing the substrate temperature and the direction of water vapor injection.