The 81st JSAP Autumn Meeting, 2020

Presentation information

Oral presentation

6 Thin Films and Surfaces » 6.4 Thin films and New materials

[10a-Z05-1~11] 6.4 Thin films and New materials

Thu. Sep 10, 2020 8:30 AM - 11:30 AM Z05

Hiroaki Nishikawa(Kindai Univ.), Masami Nishikawa(Nagaoka Univ. of Tech.), Hiroshi Murotani(Tokai Univ.)

11:00 AM - 11:15 AM

[10a-Z05-10] Deposition of Crystallized Yttria Stabilized Zirconia (YSZ) Films on Cellulose Nanopaper (CNP) Substrates at Low Temperature by Reactive Sputtering

〇(M2)Jyotish Patidar1, Susumu Horita1 (1.JAIST)

Keywords:Sputtering, YSZ, low temperature

Our research group has previously reported that yttria stabilized zirconia (YSZ) film is quite effective to stimulate crystallization of amorphous silicon (a-Si) at low temperature. A crystallized YSZ film can be deposited on a non-heat resistive cellulose nanopaper (CNP) substrate without any damage using DC magnetron sputtering with Ar and O2, which indicates a high possibility to fabricate a poly-Si TFT on CNP. CNP has been a promising substrate for fabrication of eco-friendly, cheap and flexible electronics. Previously, we have reported pre-sputtering and sputtering conditions to deposit crystallized YSZ on glass substrates. In this meeting, we further discuss deposition parameters and YSZ crystallization process on CNP in detail. Also, we discuss damage of CNP due to heat and plasma during the deposition process.