Oral presentation

[9a-Z05-1~8] 6.4 Thin films and New materials

Wed. Sep 9, 2020 9:15 AM - 11:15 AM Z05

Kohei Fujiwara(Tohoku Univ.), Motofumi Suzuki(Kyoto Univ)

△：Presentation by Applicant for JSAP Young Scientists Presentation Award
▲：English Presentation
▼：Both of Above
No Mark：None of Above

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9:15 AM - 9:30 AM

[9a-Z05-1] Controlling Dark Current of NdF₃ Thin Films by Vacuum Annealing for Fabricating High Sensitivity Vacuum Ultraviolet Detector

〇Yusuke Horiuchi¹, Seiya Kato¹, Tomoki Kato¹, Masahiko Kase², Shingo Ono¹ (1.Nagoya Tech, 2.USHIO INC)

9:30 AM - 9:45 AM

▲ [9a-Z05-2] Influence of Oxygen and Nitrogen Background Gas in Femtosecond Pulsed Laser Deposition of Nd:YAG Laser Crystal

〇Lean Dasallas¹, Joy Kristelle De Mata¹, Arriane Lacaba^2,3, Wilson Garcia³ (1.Material Science and Engineering Program, College of Science, University of the Philippines, 2.Maxim Philippines Operating Company, 3.National Institute of Physics, University of the Philippines)

9:45 AM - 10:00 AM

▲ [9a-Z05-3] Bi₂WO₆epitaxy-deterministic influence of oxygen vacancies

〇(P)Saikat Das¹, Yusuke Kozuka¹, Tadakatsu Ohkubo¹, Shinya Kasai^1,2 (1.NIMS, 2.JST-PRESTO)

10:00 AM - 10:15 AM

▲ [9a-Z05-4] Highly luminescent ZnO Thin Films Obtained by VUV-assisted Sol-Gel Processing

〇Lina Sun¹, Uda Kyota², Tsukasa Yoshida², Yoshiyuki Suzuri¹ (1.Yamagata Univ. INOEL, 2.Yamagata Univ.)

10:15 AM - 10:30 AM

[9a-Z05-5] Optical properties of Zn-based semiconductor nanoparticles films
assembled by layer-by-layer method

〇(M2)Daichi Kino¹, Yuki Narita¹, DaeGwi Kim², YongGu Shim¹ (1.Osaka Pre. Univ., 2.Osaka City Univ.)

10:30 AM - 10:45 AM

[9a-Z05-6] Relationship between lattice strain and lamella period in spinodally decomposed TiO₂-VO₂ films

〇Yuji Muraoka¹, Takahiro Fukuda², Takanori Wakita¹, Takayoshi Yokoya¹, Yoshito Takemoto² (1.Okayama Univ. RIIS, 2.Okayama Univ.)

10:45 AM - 11:00 AM

[9a-Z05-7] Strain-induced non-volatile modification of transition temperature in VO₂ thin films

〇Joe Sakai¹, Masashi Kuwahara², Motoki Takada³, Kunio Okimura³, Yoichi Uehara⁴ (1.ICN2, 2.AIST, 3.Tokai Univ., 4.RIEC Tohoku Univ.)

11:00 AM - 11:15 AM

[9a-Z05-8] Preparation of Vanadium sulfide thin films grown by multi-step chemical vapor deposition process

〇Akira Hirao¹, Hidekazu Tanaka¹, Wakayama Yutaka², Yamamoto Mahito³ (1.Osaka Univ. ISIR, 2.NIMS, 3.Kansai Univ.)

Oral presentation

[10a-Z05-1~11] 6.4 Thin films and New materials

Thu. Sep 10, 2020 8:30 AM - 11:30 AM Z05

Hiroaki Nishikawa(Kindai Univ.), Masami Nishikawa(Nagaoka Univ. of Tech.), Hiroshi Murotani(Tokai Univ.)

△：Presentation by Applicant for JSAP Young Scientists Presentation Award
▲：English Presentation
▼：Both of Above
No Mark：None of Above

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8:30 AM - 8:45 AM

[10a-Z05-1] [Highlight]Magnetic structure analysis by MCD in strain-gradient rare-earth iron garnet

〇Hiroyasu Yamahara¹, Takahito Takeda¹, Munetoshi Seki^1,2, Masaki Kobayashi^1,2, Hitoshi Tabata^1,2 (1.Univ. Tokyo, 2.Univ. Tokyo, CSRN)

8:45 AM - 9:00 AM

[10a-Z05-2] Evaluation of magneto-optical properties of Bi-substituted neodymium iron garnet films prepared by means of an Excimer-Laser assisted Metal Organic Deposition Process

〇Haruka Aiba¹, Takumi Fujita¹, Masami Nishikawa¹, Masami Kawahara², Tomohiko Nakajima³, Tetsuo Tsuchiya³, Takayuki Ishibashi¹ (1.Nagaoka Univ. of Tech., 2.Kojundo Chem. Lab., 3.AIST)

9:00 AM - 9:15 AM

[10a-Z05-3] Bayesian optimization of preparation process of Bi-substituted magnetic garnet films by means of an excimer-laser assisted metal organic deposition process

〇Takumi Fujita¹, Haruka Aiba¹, Masami Nishikawa¹, Hirofumi Nonaka¹, Masami Kawahara², Tomohiko Nakajima³, Tetsuo Tsuchiya³, Takayuki Ishibashi¹ (1.Nagaoka Univ. of Tech, 2.Kojundo Chem. Lab, 3.AIST)

9:15 AM - 9:30 AM

▲ [10a-Z05-4] Structural and Magnetic Properties of Epitaxial TmFe₂O₄ Thin Film with Self-assembled Interface

〇(D)YouJin Kim¹, Shinya Konishi¹, Yuichiro Hayasaka², Ryo Ota³, Katsuhisa Tanaka¹ (1.Kyoto Univ., 2.Tohoku Univ., 3.Hokkaido Univ.)

9:30 AM - 9:45 AM

[10a-Z05-5] Color changes of EC device combining NiO_x and WO_x in visible light and infrared light regions

〇Chihiro Nakai¹, Yoshio Abe¹, Midori Kawamura¹, Kyung Ho Kim¹, Takayuki Kiba¹, Satoko Furukawa², Naoki Shirai², Kiyotaka Takeda² (1.Kitami Inst. Technol., 2.Hokkaido Gas)

9:45 AM - 10:00 AM

[10a-Z05-6] Influence of optical properties of ITO electrode on electrochromic properties of WO₃ thin films

〇Yasuhiro Ayauchi¹, Yoshio Abe¹, Midori Kawamura¹, Kyung Ho Kim¹, Takayuki Kiba¹ (1.Kitami Inst. Technol)

10:15 AM - 10:30 AM

[10a-Z05-7] ITO transparent conductive film prepared by a microwave heating for a dye sensitized solar cell

〇Kanta Naito¹, Kosuke Suzuki¹, Masayuki Okuya¹ (1.Shizuoka Univ.)

10:30 AM - 10:45 AM

[10a-Z05-8] Porous-TiO₂ layers deposited with a non-equilibrium two-dimensional plasma and their application to dye sensitized solar cells

〇Minato Sawamura¹, Shinji Mayumi¹, Sagisaka Junpei¹, Okuya Masayuki¹ (1.Shizuoka Univ.)

10:45 AM - 11:00 AM

[10a-Z05-9] Characterization of nickel oxide thin films prepared by low temperature sputter deposition using water vapor injection into substrate and target surface

〇Masaki Kataoka¹, Yoshio Abe¹, Midori Kawamura¹, Kyung Ho Kim¹, Takayuki Kiba¹ (1.Kitami Inst. Technol)

11:00 AM - 11:15 AM

▲ [10a-Z05-10] Deposition of Crystallized Yttria Stabilized Zirconia (YSZ) Films on Cellulose Nanopaper (CNP) Substrates at Low Temperature by Reactive Sputtering

〇(M2)Jyotish Patidar¹, Susumu Horita¹ (1.JAIST)

11:15 AM - 11:30 AM

[10a-Z05-11] Fabrication of Flexible Epitaxial BaTiO₃ (001) Thin Films with Bottom Electrode

〇(M1)Tomofumi Mizuyama¹, Norimitsu Hirosaki², Hiroaki Nishikawa³ (1.KIndai Univ., Grad. Sch., 2.Taiyou Industrial Co., LTD., 3.Kindai Univ.)

Oral presentation

[10p-Z05-1~19] 6.4 Thin films and New materials

Thu. Sep 10, 2020 12:30 PM - 5:30 PM Z05

Katsuhisa Tanaka(Kyoto Univ.), Yoshinobu Nakamura(Univ. of Tokyo), Yuji Muraoka(Okayama Univ.)

△：Presentation by Applicant for JSAP Young Scientists Presentation Award
▲：English Presentation
▼：Both of Above
No Mark：None of Above

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12:30 PM - 12:45 PM

▲ [10p-Z05-1] Identify the rippled structure of MoS₂ film from HRTEM image

〇(D)Lilin Xie¹, Yoshifumi Oshima¹ (1.JAIST)

12:45 PM - 1:00 PM

[10p-Z05-2] Surface Modification of Epitaxial Graphene for Thin-Film Si Growth

〇(M1)Tomohiro Katsuzaki¹, Riku Shamoto¹, Ryuichi Hirai¹, Akihiro Hashimoto¹ (1.Univ. of Fukui)

1:00 PM - 1:15 PM

[10p-Z05-3] Characterization of Surface diffusion in Na₂B₁₂H₁₁SH monolayer on Au(111)

〇(D)Takanori Harashima¹, Yoshihide Hattori², Hiroshi Shiigi³, Tomoaki Nishino¹ (1.Tokyo Institute of Technology, 2.Research Center of BNCT, Osaka Prefecture Univ., 3.Graduate School of Engineering, Osaka Prefecture Univ.)

1:15 PM - 1:30 PM

[10p-Z05-4] Fabrication and structural analysis of a-CNx:H thin films with high nitrogen content by microwave plasma CVD of the acetylene-nitrogen gas mixture

〇(M1)Yuga Sato¹, Haruhiko Ito¹ (1.Nagaoka Univ.)

1:30 PM - 1:45 PM

[10p-Z05-5] Synthesis and structural analysis of high nitrogen containing a-CNx:H thin films using radio frequency plasma CVD of the acetylene-N₂-Ar gas mixture

〇(M1)Ryota Watanuki¹, Haruhiko Ito¹ (1.Nagaoka Univ. of Tech.)

1:45 PM - 2:00 PM

[10p-Z05-6] Attempt to Measure Thermal Diffusivity Using H₂-O₂ Flame of Ceramic Films Obtained by Atmospheric Chemical Vapor Deposition

〇Hidemichi Honda¹, Yanxin Dan¹, Keiji Komatsu¹, Hidetoshi Saitoh¹ (1.Nagaoka Univ. Tech.)

2:00 PM - 2:15 PM

[10p-Z05-7] Synthesis of Nickel-related compounds Films via Metal-EDTA Complex Solution
with Strong Heat Process

Zhenyu Guo¹, Liang Shaoji¹, Atsushi Nakamura^2,1, 〇Keiji Komatsu¹, Hidetoshi Saitoh¹ (1.Nagaoka Univ. Tech., 2.Chubu Chelest Co., Ltd.)

2:15 PM - 2:30 PM

[10p-Z05-8] Attempt to Cu-Zn Alloy Coating from Metal-EDTA Complex Solutions
with Strong Heat Process

〇(M1)SHAOJI LIANG¹, Atsushi Nakamura^2,1, Keiji Komatsu¹, Hidetoshi Saitoh¹ (1.Nagaoka Univ. Tech., 2.Chubu Chelest Co., Ltd.)

2:30 PM - 2:45 PM

[10p-Z05-9] Fabrication and Electrical/Optical Characterization of Metal Nanomesh Structures

〇Mai Ugajin¹, Takayuki Kiba¹, Midori Kawamura¹, Yoshio Abe¹, Kyung Ho Kim¹, Yafeng Chen², Junichi Takayama², Satoshi Hiura², Akihiro Murayama² (1.Kitami Inst. Tech., 2.IST, Hokkaido Univ.)

3:00 PM - 3:15 PM

△ [10p-Z05-10] Characterzation of Al/Ag film consists of layers sputtered in different gases

〇Yusaku Ohara¹, Midori Kawamura¹, Takayuki Kiba¹, Yoshio Abe¹, Kyung Ho Kim¹ (1.Kitami Inst. Tech.)

3:15 PM - 3:30 PM

△ [10p-Z05-11] Analysis on Effects of Underlayer on Corrosion Resistance of Ag-based Transparent Conductive Film in Chloride Solution

〇Tomohiro Otani¹, Yuto Toshimori¹, Sohei Nonaka¹ (1.Mitsubishi Materials Corp.)

3:30 PM - 3:45 PM

△ [10p-Z05-12] Effect of 172 nm vacuum-ultraviolet light irradiation to the cyclic olefin polymer substrate surface on orientated growth of ZnO thin films

〇(D)Tomoaki Oga¹, Atsushi Oshima¹, Naho Kaneko¹, Satoru Kaneko^2,1, Akifumi Matsuda¹, Mamoru Yoshimoto¹ (1.Tokyo Tech, 2.KISTEC)

3:45 PM - 4:00 PM

△ [10p-Z05-13] Study on the growth condition of Zn_xMn_1-xS buffer layer for nonpolar AlN growth on Si

〇Masaya Morita^1,2, Keiji Ishibashi³, Kenichirou Takahashi³, Toyohiro Chikyow², Atsushi Ogura¹, Takahiro Nagata² (1.Meiji Univ., 2.NIMS, 3.COMET Inc.)

4:00 PM - 4:15 PM

△ [10p-Z05-14] Growth of high-quality CuI thin films by molecular beam epitaxy

〇(M2)Sotaro Inagaki¹, Masao Nakamura^2,3, Naoya Aizawa^2,3, Licong Peng², Xiuzhen Yu², Yoshinori Tokura^1,2,4, Masashi Kawasaki^1,2 (1.Univ. of Tokyo, 2.RIKEN-CEMS, 3.JST-PRESTO, 4.Tokyo College)

4:15 PM - 4:30 PM

▼ [10p-Z05-15] The thickness effect on the BiOI thin films prepared by SILAR

〇(M2)MATIUR MD RAHMAN¹, M.A. Al Noman¹, Shinya Kato¹, Naoki Kishi¹, Tetsuo Soga¹ (1.Nagoya Inst. of Tech)

4:30 PM - 4:45 PM

▼ [10p-Z05-16] Solid-State Electrochemical Protonation/Oxidation of Oxygen Sponge SrCoO_2.5 Films

〇(DC)Qian Yang¹, Bin Feng², Yuichi Ikuhara², Hyoungjeen Jeen³, Hai Jun Cho^1,4, Hiromichi Ohta^1,4 (1.IST-Hokkaido U., 2.U. Tokyo, 3.Pusan Nat'l U., 4.RIES-Hokkaido U.)

4:45 PM - 5:00 PM

△ [10p-Z05-17] Magnetoresistance of low temperature PLD grown Ni_1-xFe_xO(111) epitaxial thin films

〇(M2)Yoshiharu Shinozaki¹, Kenta Kaneko¹, Nobuo Tsuchimine², Satoru Kaneko^3,1, Akifumi Matsuda¹, Mamoru Yoshimoto¹ (1.Tokyo Tech, 2.TOSHIMA Manu., 3.KISTEC)

5:00 PM - 5:15 PM

△ [10p-Z05-18] Light Scattering of Low Refractive Index SiO₂ Optical Thin Films Deposited by Sputtering and Electron Beam Evaporation Part 2

〇(M1)Taisei Wakamiya¹, Shigeharu Matumoto², Hiroshi Murotani¹ (1.Graduate School of Eng. , Tokai Univ., 2.SHINCRON CO.LTD.)

5:15 PM - 5:30 PM

△ [10p-Z05-19] Solid state crystallization of titanium oxide thin films, and modification of their optical and electric properties by post-depositional uniaxial compressive annealing

〇(M2)Takahiro Ikuta¹, Shohei Hisatomi¹, Tomoaki Oga¹, Kaneko Satoru^2,1, Akifumi Matsuda¹, Mamoru Yoshimoto¹ (1.Tokyo Tech, 2.KISTEC)

Sessions

6 Thin Films and Surfaces » 6.4 Thin films and New materials

[9a-Z05-1~8] 6.4 Thin films and New materials

▲ [9a-Z05-2] Influence of Oxygen and Nitrogen Background Gas in Femtosecond Pulsed Laser Deposition of Nd:YAG Laser Crystal

▲ [9a-Z05-3] Bi2WO6 epitaxy-deterministic influence of oxygen vacancies

▲ [9a-Z05-4] Highly luminescent ZnO Thin Films Obtained by VUV-assisted Sol-Gel Processing

[10a-Z05-1~11] 6.4 Thin films and New materials

▲ [10a-Z05-4] Structural and Magnetic Properties of Epitaxial TmFe2O4 Thin Film with Self-assembled Interface

▲ [10a-Z05-10] Deposition of Crystallized Yttria Stabilized Zirconia (YSZ) Films on Cellulose Nanopaper (CNP) Substrates at Low Temperature by Reactive Sputtering

[10p-Z05-1~19] 6.4 Thin films and New materials

▲ [10p-Z05-1] Identify the rippled structure of MoS2 film from HRTEM image

△ [10p-Z05-10] Characterzation of Al/Ag film consists of layers sputtered in different gases

△ [10p-Z05-11] Analysis on Effects of Underlayer on Corrosion Resistance of Ag-based Transparent Conductive Film in Chloride Solution

△ [10p-Z05-12] Effect of 172 nm vacuum-ultraviolet light irradiation to the cyclic olefin polymer substrate surface on orientated growth of ZnO thin films

△ [10p-Z05-13] Study on the growth condition of ZnxMn1-xS buffer layer for nonpolar AlN growth on Si

△ [10p-Z05-14] Growth of high-quality CuI thin films by molecular beam epitaxy

▼ [10p-Z05-15] The thickness effect on the BiOI thin films prepared by SILAR

▼ [10p-Z05-16] Solid-State Electrochemical Protonation/Oxidation of Oxygen Sponge SrCoO2.5 Films

△ [10p-Z05-17] Magnetoresistance of low temperature PLD grown Ni1-xFexO(111) epitaxial thin films

△ [10p-Z05-18] Light Scattering of Low Refractive Index SiO2 Optical Thin Films Deposited by Sputtering and Electron Beam Evaporation Part 2

△ [10p-Z05-19] Solid state crystallization of titanium oxide thin films, and modification of their optical and electric properties by post-depositional uniaxial compressive annealing

Authenticate

▲ [9a-Z05-3] Bi₂WO₆epitaxy-deterministic influence of oxygen vacancies

▲ [10a-Z05-4] Structural and Magnetic Properties of Epitaxial TmFe₂O₄ Thin Film with Self-assembled Interface

▲ [10p-Z05-1] Identify the rippled structure of MoS₂ film from HRTEM image

△ [10p-Z05-13] Study on the growth condition of Zn_xMn_1-xS buffer layer for nonpolar AlN growth on Si

▼ [10p-Z05-16] Solid-State Electrochemical Protonation/Oxidation of Oxygen Sponge SrCoO_2.5 Films

△ [10p-Z05-17] Magnetoresistance of low temperature PLD grown Ni_1-xFe_xO(111) epitaxial thin films

△ [10p-Z05-18] Light Scattering of Low Refractive Index SiO₂ Optical Thin Films Deposited by Sputtering and Electron Beam Evaporation Part 2