[10p-Z05-1~19] 6.4 Thin films and New materials

[10p-Z05-5] Synthesis and structural analysis of high nitrogen containing a-CNx:H thin films using radio frequency plasma CVD of the acetylene-N₂-Ar gas mixture

〇(M1)Ryota Watanuki¹, Haruhiko Ito¹ (1.Nagaoka Univ. of Tech.)

Keywords:Plasma CVD, Amorphous carbon nitride

In high frequency plasma CVD, carbon nitride film was prepared from acetylene and nitrogen as raw materials. Until now, our laboratory has prepared carbon nitride thin films from liquid organic compounds. In this study, gas raw material was used. This time, the amounts of acetylene and nitrogen to be introduced were changed, and the nitrogen content, the change in bonding state, the surface shape of the film, etc. were investigated. XPS, FT-IR, GD-OES, and stylus type film thickness meter were used for the analysis.