Study of Coating Process for Thick Photo-resist using Minimal Fab Coater

Presentation information

Oral presentation

13 Semiconductors » 13.4 Si processing /Si based thin film / MEMS / Equipment technology

Thu. Sep 10, 2020 8:45 AM - 11:30 AM Z10

Hitoshi Habuka(Yokohama Natl. Univ.)

10:45 AM - 11:00 AM

〇Shuhei Nakamichi¹, Hiroyuki Tanaka², Fumito Imura², Shuichi Noda², Sommawan Khumpuang^1,2, Shiro Hara^1,2 (1.Minimal Fab, 2.AIST)

Keywords:Minimal Fab, Photoresist, Spin-coater