The 81st JSAP Autumn Meeting, 2020

Presentation information

Oral presentation

CS Code-sharing session » 【CS.5】 Code-sharing Session of 6.1 & 13.3 & 13.5

[10a-Z24-1~12] 【CS.5】 Code-sharing Session of 6.1 & 13.3 & 13.5

Thu. Sep 10, 2020 8:45 AM - 12:00 PM Z24

Hironori Fujisawa(Univ. of Hyogo), Shosuke Fujii(Kioxia)

11:15 AM - 11:30 AM

[10a-Z24-10] Thickness dependence of antiferroelectricity in ALD ultrathin ZrO2 films

〇(D)Xuan Luo1, Kasidit Toprasertpong1, Mitsuru Takenaka1, Shinichi Takagi1 (1.Univ. of Tokyo)

Keywords:antiferroelectricity, dielectrics, scalability

In this work, the thickness dependence of the antiferroelectricity (AFE) in ALD-grown ZrO2 thin films is investigated in order to examine the scalability of AFE ZrO2 films. The AFE-like characteristics were observed from the films with 5.3nm for different PMA temperatures. The influence of film thickness and PMA temperature on AFE-characteristics of ZrO2 are discussed.