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▼ [10a-Z24-6] Ferroelectric Properties of Hafnium-Zirconium-Dioxide Prepared by Chemical Solution Process for MFM and MFS Structures
Keywords:Hafnium Zirconium Dioxide, Chemical Solution Process, Ferroelectric FET
Y-HZO thin films were fabricated by CSD and electrical properties of MFM and MFS structures were characterized. Vacuum annealed Y-HZO film showed better ferroelectricity than N2 and O2 annealed samples.