The 81st JSAP Autumn Meeting, 2020

Presentation information

Oral presentation

15 Crystal Engineering » 15.4 III-V-group nitride crystals

[10p-Z02-1~22] 15.4 III-V-group nitride crystals

Thu. Sep 10, 2020 1:00 PM - 7:15 PM Z02

Narihito Okada(Yamaguchi Univ.), Ryota Ishii(Kyoto Univ.), Hideaki Murotani(Tokuyama College)

1:30 PM - 1:45 PM

[10p-Z02-2] Bulk GaN crystal growth by Low pressure acidic ammonothermal (LPAAT) method using 4 inch scale autoclave

kouhei kurimoto1,2, quanxi bao1,2, yutaka mikawa3, daisuke tomida2, kouhei shima2, kazunobu kojima2, toru ishiguro2, shigefusa chichibu2 (1.Japan Steel Works, 2.IMRAM Tohoku Univ., 3.Mitsubishi Chemical Corp.)

Keywords:GaN, Ammonothermal method, Bulk crystal

The acid ammonothermal method is expected as one of mass production methods for large diameter bulk GaN crystals.We have reported that we succeeded in growth using a 4-inch size seed crystal by conducting a crystal growth experiment by introducing a GaN crystal growth autoclave with an inner diameter of 120 mm capable of manufacturing 4-inch diameter wafers.In this talk, we report on the latest achievements of crystal growth using the autoclave.