[11p-Z03-3~12] 8.2 Plasma deposition of thin film, plasma etching and surface treatment

△ [11p-Z03-10] Change in charge density at the bottom of capillary plate in a pulse modulated CCP

〇Naoya Nakahara¹, Makoto Moriyama¹, Haruka Suzuki^1,2, Hirotaka Toyoda^1,2,3 (1.Nagoya Univ., 2.cLPS, 3.NIFS)

Keywords:Capacitively coupled plasma, Reactive ion etching, High aspect ratio etching