The 81st JSAP Autumn Meeting, 2020

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Oral presentation

8 Plasma Electronics » 8.2 Plasma deposition of thin film, plasma etching and surface treatment

[11p-Z03-3~12] 8.2 Plasma deposition of thin film, plasma etching and surface treatment

Fri. Sep 11, 2020 1:30 PM - 4:15 PM Z03

Kenji Ishikawa(Nagoya Univ.), Makoto Satake(Hitachi)

2:30 PM - 2:45 PM

▼ [11p-Z03-7] Surface fluorination of Y2O3 irradiated by low energy CF3+ ion and F+ ion

〇(M2)Hojun Kang1, Tomoko Ito1, Junghwan Um2, Hikaru Kokura2, Taekyun Kang2, Sungil Cho2, Hyunjung Park2, Kazuhiro Karahashi1, Satoshi Hamaguchi1 (1.Osaka Univ., 2.Samsung Electronics)

Keywords:Yttria, fluorination