The 81st JSAP Autumn Meeting, 2020

Presentation information

Oral presentation

6 Thin Films and Surfaces » 6.3 Oxide electronics

[11p-Z07-1~14] 6.3 Oxide electronics

Fri. Sep 11, 2020 1:00 PM - 4:45 PM Z07

Hisashi Shima(AIST), Seiichi KATO(物質・材料研究機構)

4:00 PM - 4:15 PM

[11p-Z07-12] Direct Observation of Electronic Structure of Amorphous Alumina ReRAM by Synchrotron Radiation

Seiichi Kato1, Seisuke Nigo1, Masato Kubota2, Kenta Amemiya3 (1.NIMS, 2.JAEA, 3.KEK IMSS)

Keywords:ReRAM, amorphous alumina, synchrotron radiation

We proposed a model to explain the switching effect of amorphous alumina with a moderate density of oxygen vacancies. When electrons do not exist at oxygen vacancy (Vo), the Vo is regarded as a divalent pseudo atom (Vo+2). Vo+2 becomes Vo+1 by an electron injection When the number of injected electrons exceeds the threshold, Vo+1 electrons overlap and delocalize, and the conductive electronic sub-band is generated. To detect differences in the electronic structure between ON- and OFF- state in an element-selective manner, we performed X-ray absorption spectroscopy measurements with a high energy resolution. When we confirmed the X-ray absorption spectra of the ON- and OFF-samples near the O and Al K-absorption edge, a spectral peak is observed only in the ON-sample near the O K-absorption edge. We conclude that the peak is caused by conductive sub-band newly created in ON-sample.