[11p-Z10-1~8] 13.3 Insulator technology

[11p-Z10-5] Manufacture and evaluation of MOS gate structure by using TiO₂

〇Kenichirou Toyoda¹, Yoshitaka Iwazaki¹, Tomo Ueno¹ (1.TUAT)

Keywords:semiconductor, TiO2, MOS