The 81st JSAP Autumn Meeting, 2020

Presentation information

Oral presentation

6 Thin Films and Surfaces » 6.2 Carbon-based thin films

[8a-Z05-1~11] 6.2 Carbon-based thin films

Tue. Sep 8, 2020 9:00 AM - 12:00 PM Z05

Hiroki Akasaka(Tokyo Tech), Yasuharu Ohgoe(Tokyo Denki Univ.)

10:00 AM - 10:15 AM

[8a-Z05-5] Atomic hydrogen irradiation on DLCs and in-situ observation of their surface by XAS

Masahito Niibe1, Akira Heya2, Hiroki Akasaka3, Kazuhiro Kanda1 (1.LASTI, Univ. Hyogo, 2.Eng. Univ. Hyogo, 3.Tokyo Tech)

Keywords:atomic hydrogen, Contamination cleaning, Soft X-ray absorption spectroscopy

Atomic hydrogen (AH) is highly reactive as a radical and releases 4.5 eV of energy upon recombination, therefore, it is expected to be used for surface treatment/cleaning by reduction reaction. In this study, we attached an AH generator to a soft X-ray absorption spectroscopy (XAS) equipment and attempted to measure the in-situ absorption spectra of the DLC material before and after AH irradiation.