[8p-Z21-1~7] 8.1 Plasma production and diagnostics

[8p-Z21-2] Ionic composition analysis of high-power pulsed magnetron sputtering using a reflectron-type time-of-flight mass spectrometer

Yuki Nakagomi¹, Hiroshi Nishida¹, Nobuo Nishimiya¹, 〇Masaomi Sanekata¹, Hiroaki Yamamoto², Naoyuki Hirata², Masahide Tona², Keizo Tsukamoto², Kiyokazu Fuke³, Keijiro Ohshimo⁴, Fuminori Misaizu⁴ (1.Tokyo Polytechnic Univ., 2.Ayabo Corp., 3.Toyota Phys. & Chem. Res. Inst., 4.Tohoku Univ.)

Keywords:sputtering, High-power pulsed magnetron sputtering, Time-of-flight mass spectrometry

In high power pulsed magnetron sputtering (HPPMS), it is well known that dense ion particles are generated in the plasma. In the film forming process, the ion-to-neutral particle number ratio and the ion valence ratio in plasma are important indexes that influence the film forming performance. Our research group has developed a new particle analysis method using time-of-flight mass spectrometry (TOFMS) to evaluate these ratios in HPPMS. In this presentation, we will report on the ion composition (component and valence) of plasma particles in HPPMS with the observation results obtained using TOFMS.