HU LI

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Speaker, Author, Co-Author

Thu. Mar 12, 2020 1:45 PM - 6:00 PM A205 (6-205)

Oral presentation
| 8 Plasma Electronics
| 8.2 Plasma deposition of thin film, plasma etching and surface treatment

[12p-A205-1~15] 8.2 Plasma deposition of thin film, plasma etching and surface treatment

1:45 PM - 2:00 PM

[12p-A205-1] Roles of oxygen ion and radical on deposition mechanisms of SiO₂ film in PECVD process using TEOS based plasma

〇HU LI¹, Denpoh Kazuki¹ (1.TTS)