Toshio Hayashi

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Speaker, Author, Co-Author

Thu. Mar 12, 2020 1:45 PM - 6:00 PM A205 (6-205)

Oral presentation
| 8 Plasma Electronics
| 8.2 Plasma deposition of thin film, plasma etching and surface treatment

[12p-A205-1~15] 8.2 Plasma deposition of thin film, plasma etching and surface treatment

4:15 PM - 4:30 PM

[12p-A205-10] An investigation of novel gases for etching process by computational chemistry

〇Toshio Hayashi¹, Makoto Sekine¹, Kenji Ishikawa¹, Masaru Hori¹ (1.Nagoya University)