Hojun Kang

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Speaker, Author, Co-Author

Thu. Mar 12, 2020 1:45 PM - 6:00 PM A205 (6-205)

Oral presentation
| 8 Plasma Electronics
| 8.2 Plasma deposition of thin film, plasma etching and surface treatment

[12p-A205-1~15] 8.2 Plasma deposition of thin film, plasma etching and surface treatment

5:00 PM - 5:15 PM

▼ [12p-A205-12] Surface fluorination of Y₂O₃ irradiated by low energy F⁺ ion and F radical

〇(M1)Hojun Kang¹, Tomoko Ito¹, Junghwan Um², Hikaru Kokura², Taekyun Kang², Sungil Cho², Hyunjung Park², Kazuhiro Karahashi¹, Satoshi Hamaguchi¹ (1.Osaka Univ., 2.Samsung Electronics)