Shin Ogawa

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Speaker, Author, Co-Author

Thu. Mar 12, 2020 1:45 PM - 6:00 PM A205 (6-205)

Oral presentation
| 8 Plasma Electronics
| 8.2 Plasma deposition of thin film, plasma etching and surface treatment

[12p-A205-1~15] 8.2 Plasma deposition of thin film, plasma etching and surface treatment

2:00 PM - 2:15 PM

[12p-A205-2] Numerical Analysis of Influence of Ar Mixture-Ratio on DLC surface condition and H content using Ar/CH₄ Plasma-Enhanced CVD Model

〇(M2)Shin Ogawa¹, Akinori Oda¹, Takayuki Ohta², Hiroyuki Kousaka³ (1.Chiba Tech., 2.Meijo Univ., 3.Gifu Univ.)