Masahiro Hazumi

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Speaker, Author, Co-Author

Thu. Mar 12, 2020 1:45 PM - 6:00 PM A205 (6-205)

Oral presentation
| 8 Plasma Electronics
| 8.2 Plasma deposition of thin film, plasma etching and surface treatment

[12p-A205-1~15] 8.2 Plasma deposition of thin film, plasma etching and surface treatment

3:15 PM - 3:30 PM

△ [12p-A205-6] Study of etching process using CHF3 gas condensed layer in cryogenic region

〇Masahiro Hazumi¹, Suganthamalar Selvaraj², Hsiao Shih-Nan², Sekine Makoto², Hayashi Hisataka^3,2, Sasaki Toshiyuki³, Abe Chihiro³, Tsutsumi Takayoshi², Ishikawa Kenji², Hori Masaru² (1.Nagoya Univ., 2.cLPS, Nagoya Univ, 3.KIOXIA Corp)

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