Rei Tanaka

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Speaker, Author, Co-Author

Fri. Mar 13, 2020 9:00 AM - 10:30 AM A205 (6-205)

Oral presentation
| 8 Plasma Electronics
| 8.2 Plasma deposition of thin film, plasma etching and surface treatment

[13a-A205-1~6] 8.2 Plasma deposition of thin film, plasma etching and surface treatment

9:30 AM - 9:45 AM

△ [13a-A205-3] On-site C₂F₄ generation from CF₄ feedstock gas
using moderate-pressure plasma

〇(M1)Rei Tanaka¹, Tomoyuki Tanaka¹, Daiki Iino², Kazuaki Kurihara², Hiroyuki Fukumizu², Jouta Fukuhara², Hisataka Hayashi², Hiroaki kakiushi¹, Kiyoshi Yasutake¹, Hiromasa Ohmi¹ (1.Osaka Univ., 2.Kioxia Corp.)