9:30 AM - 11:30 AM
[13a-PA2-2] Fabrication and Characterization of High-k Gate Insulating Films by RF-Sputtering Method
〇Daiki Tezuka1, Kenshin Narisawa1, Kiyoshi Uchiyama1 (1.National Institute of Technology, Tsuruoka College)
Fri. Mar 13, 2020 9:30 AM - 11:30 AM PA2 (PA)
9:30 AM - 11:30 AM
〇Daiki Tezuka1, Kenshin Narisawa1, Kiyoshi Uchiyama1 (1.National Institute of Technology, Tsuruoka College)