Takashi Nishimura

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Speaker, Author, Co-Author

Sat. Mar 14, 2020 10:00 AM - 12:00 PM D411 (11-411)

Oral presentation
| 6 Thin Films and Surfaces
| 6.5 Surface Physics, Vacuum

[14a-D411-1~7] 6.5 Surface Physics, Vacuum

10:00 AM - 10:15 AM

[14a-D411-1] Thermal image analysis of the formation process of silicon protrusions in surface liquid phase epitaxy under locally applied tensile stress

〇Takashi Nishimura¹, Fumiya Isobe¹, Masahiko Tomitori² (1.Suzuka college, 2.JAIST)