Zaoyang Lin

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Speaker, Author, Co-Author

Sat. Mar 14, 2020 1:45 PM - 5:30 PM A303 (6-303)

Oral presentation
| Code-sharing Session
| 【CS.4】 Code-sharing Session of 6.1 & 13.3 & 13.5

[14p-A303-1~14] 【CS.4】 Code-sharing Session of 6.1 & 13.3 & 13.5

4:15 PM - 4:30 PM

▲ [14p-A303-10] Improvement of ferroelectric properties of TiN/Hf_0.5Zr_0.5O₂/Si gate stacks by inserting Al₂O₃ interfacial layers

〇Zaoyang Lin¹, Tsung-En Lee¹, Hanzhi Tang¹, Kasidit Toprasertpong¹, Mitsuru Takenaka¹, Shinichi Takagi¹ (1.The Univ. of Tokyo)