The 67th JSAP Spring Meeting 2020

Presentation information

Print

Oral presentation

8 Plasma Electronics » 8.2 Plasma deposition of thin film, plasma etching and surface treatment

[12p-A205-1~15] 8.2 Plasma deposition of thin film, plasma etching and surface treatment

Thu. Mar 12, 2020 1:45 PM - 6:00 PM A205 (6-205)

Takayuki Ohta(Meijo Univ.), Masanaga Fukasawa(Sony Semiconductor Solutions), Taku Iwase(日立製作所)

2:45 PM - 3:00 PM

[12p-A205-5] Effect of plasma surface treatment on molecular orientation of self-assembled layer

〇Yoshinori Oda1, Takayoshi Tsutsumi1, Kenji Ishikawa1, Masaru Hori1 (1.Nagoya Univ.)

Keywords:plasma surface treatment, self-assembled layer

Using X-ray photoelectron spectroscopy (XPS) and Fourier transform infrared spectroscopy (FT-IR), I mention the effect of substrate pretreatment with oxygen plasma on the molecular orientation of self-assembled layer. In addition, I will discuss appropriate substrate surface conditions for the formation of higher molecular density molecular layer.