4:00 PM - 4:15 PM
[12p-A205-9] The effect of reactive fluorocarbon species on high aspect ratio etching
Keywords:etching, SiO2, plasma
Presentation information
Oral presentation
8 Plasma Electronics » 8.2 Plasma deposition of thin film, plasma etching and surface treatment
[12p-A205-1~15] 8.2 Plasma deposition of thin film, plasma etching and surface treatment
Thu. Mar 12, 2020 1:45 PM - 6:00 PM A205 (6-205)
Takayuki Ohta(Meijo Univ.), Masanaga Fukasawa(Sony Semiconductor Solutions), Taku Iwase(日立製作所)