The 67th JSAP Spring Meeting 2020

Presentation information

Oral presentation

8 Plasma Electronics » 8.1 Plasma production and diagnostics

[12p-A302-1~18] 8.1 Plasma production and diagnostics

Thu. Mar 12, 2020 1:15 PM - 6:00 PM A302 (6-302)

Kentaro Tomita(Kyushu Univ.), Nakagawa Yusuke(首都大), Manabu Tanaka(Kyushu Univ.)

4:00 PM - 4:15 PM

[12p-A302-11] Effects of applied frequency on plasma density at Torr-order pressure region in capacitively coupled plasmas

Kazuki Denpoh1, Yasushi Morita1, Tatsuo Matsudo1 (1.TTS)

Keywords:capacitively coupled plasma, electron density, Torr-order pressure

Effects of applied frequency on plasma density in capacitively coupled plasmas have been investigated at Torr-order pressures, which are typically utilized in PECVD processes. In both numerical simulations and experiments, it is confirmed that low frequency from 450 kHz to 2 MHz is more effective to generate higher density plasma than 13.56 MHz at Torr-order pressures although it is generally believed that higher density plasma can be obtained as the applied frequency increases. At low frequency, in addition to the gamma mode, collapse and reformation of the plasma bulk induced by ion density oscillation become crucial.

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