[12p-A302-1~18] 8.1 Plasma production and diagnostics

[12p-A302-11] Effects of applied frequency on plasma density at Torr-order pressure region in capacitively coupled plasmas

〇Kazuki Denpoh¹, Yasushi Morita¹, Tatsuo Matsudo¹ (1.TTS)

Keywords:capacitively coupled plasma, electron density, Torr-order pressure

Effects of applied frequency on plasma density in capacitively coupled plasmas have been investigated at Torr-order pressures, which are typically utilized in PECVD processes. In both numerical simulations and experiments, it is confirmed that low frequency from 450 kHz to 2 MHz is more effective to generate higher density plasma than 13.56 MHz at Torr-order pressures although it is generally believed that higher density plasma can be obtained as the applied frequency increases. At low frequency, in addition to the gamma mode, collapse and reformation of the plasma bulk induced by ion density oscillation become crucial.