The 67th JSAP Spring Meeting 2020

Presentation information

Oral presentation

13 Semiconductors » 13.5 Semiconductor devices/ Interconnect/ Integration technologies

[12p-A305-1~13] 13.5 Semiconductor devices/ Interconnect/ Integration technologies

Thu. Mar 12, 2020 1:45 PM - 5:15 PM A305 (6-305)

Munehiro Tada(NEC), Marina Yamaguchi(Kioxia)

1:45 PM - 2:00 PM

[12p-A305-1] Analysis of Extremely Large Random Telegraph Noise (RTN) in Ultra-Narrow Gate-All-Around (GAA) Silicon Nanowire Transistors

〇(M2)Hayato Kimura1, Tomoko Mizutani1, Kiyoshi Takeuchi1, Takuya Saraya1, Masaharu Kobayashi2,1, Toshiro Hiramoto1 (1.IIS, Univ. of Tokyo, 2.d.lab, Univ of Tokyo)

Keywords:nanowire, gate-all-around, random telegraph noise

Silicon nanowire transistor with gate-all-around (GAA) structures has attracted much attention as next-generation device candidate. On the other hand, random telegraph noise (RTN) due to traps is one of the major issues for scaled transistors. In this paper, we report extremely large random telegraph noise (RTN) in ultra-narrow silicon GAA nanowire transistors which cannot be found in Bulk and SOI transistors.