Negative magnetoresistance in helium-ion-irradiated graphene

Takuya Iwasaki; Manoharan Muruganathan; Masashi Akabori; Yoshifumi Morita; Satoshi Moriyama; Shinichi Ogawa; Yutaka Wakayama; Hiroshi Mizuta; Shu Nakaharai

Presentation information

Symposium (Oral)

Symposium » Recent progress in Advanced Ion Microscopy: Application to nano materials and devices

[13p-A303-1~9] Recent progress in Advanced Ion Microscopy: Application to nano materials and devices

Fri. Mar 13, 2020 1:30 PM - 5:15 PM A303 (6-303)

Reo Kometani(Univ. of Tokyo), Shinichi Ogawa(AIST)

4:15 PM - 4:30 PM

▲ [13p-A303-7] Negative magnetoresistance in helium-ion-irradiated graphene

Takuya Iwasaki¹, Manoharan Muruganathan², Masashi Akabori², Yoshifumi Morita³, Satoshi Moriyama¹, 〇Shinichi Ogawa⁴, Yutaka Wakayama¹, Hiroshi Mizuta^2,5, Shu Nakaharai¹ (1.NIMS, 2.JAIST, 3.Gunma Univ, 4.AIST, 5.Hitachi Camb. Lab)

Keywords:Graphene, Helium ion, Magnetoresistance

« Previous in this session
Next in this session »

▲