Symposium (Oral)

[13p-A303-1~9] Recent progress in Advanced Ion Microscopy: Application to nano materials and devices

Fri. Mar 13, 2020 1:30 PM - 5:15 PM A303 (6-303)

Reo Kometani(Univ. of Tokyo), Shinichi Ogawa(AIST)

△：Presentation by Applicant for JSAP Young Scientists Presentation Award
▲：English Presentation
▼：Both of Above
No Mark：None of Above

+Add all to schedule

1:30 PM - 2:00 PM

▲ [13p-A303-1] Planar-type Si thermoelectric generators using nanopatterning

〇Masahiro Nomura¹ (1.IIS, Univ. of Tokyo)

2:00 PM - 2:30 PM

▲ [13p-A303-2] Large scale integrated superconducting Josephson circuits fabricated with focused helium Ion irradiation.

〇Shane Andrew Cybart¹, Jay C. LeFebvre¹ (1.UC Riverside)

2:30 PM - 3:00 PM

▲ [13p-A303-3] Fabrication of nanofiber Bragg cavities with lower acceleration voltage to avoid process damage

〇Hideaki Takashima¹, Atsushi Fukuda¹, Hiroki Kawaguchi¹, Kazuki Fukushige¹, Konosuke Shimazaki¹, Toshiyuki Tashima¹, Shigeki Takeuchi¹ (1.Kyoto Univ.)

3:00 PM - 3:15 PM

▲ [13p-A303-4] Optomechanical device fabrication for the light detection using focused-ion-beam processing

〇Reo Kometani¹, Penekwong Khemnat¹, Shin-ichi Warisawa¹ (1.Grad. Sch. of Front. Sci., Univ. of Tokyo)

3:15 PM - 3:30 PM

▲ [13p-A303-5] Helium Ion Beam Milling for Chiral Nanostructures

〇(DC)Guenter Ellrott^1,2, Shinichi Ogawa³, Yukinori Morita³, Manoharan Muruganathan¹, Vojislav Krstic², Hiroshi Mizuta^1,4 (1.JAIST, 2.FAU, 3.AIST, 4.Hitachi Camb. Lab)

3:45 PM - 4:15 PM

▲ [13p-A303-6] Analytical capabilities on FIB instruments using SIMS: applications, current developments and prospects

〇Olivier De Castro¹, Jean-Nicolas Audinot¹, Antje Biesemeier¹, Quang Hung Hoang¹, Tom Wirtz¹ (1.LIST, Luxembourg)

4:15 PM - 4:30 PM

▲ [13p-A303-7] Negative magnetoresistance in helium-ion-irradiated graphene

Takuya Iwasaki¹, Manoharan Muruganathan², Masashi Akabori², Yoshifumi Morita³, Satoshi Moriyama¹, 〇Shinichi Ogawa⁴, Yutaka Wakayama¹, Hiroshi Mizuta^2,5, Shu Nakaharai¹ (1.NIMS, 2.JAIST, 3.Gunma Univ, 4.AIST, 5.Hitachi Camb. Lab)

4:30 PM - 4:45 PM

▲ [13p-A303-8] Voltage contrast of BaTiO3 dielectric material by Helium Ion Microscopy

〇Shinichi Ogawa¹, Akira Saito² (1.AIST, 2.Murata Manufacturing)

4:45 PM - 5:15 PM

▲ [13p-A303-9] Application of Neon Ion Beam for Processing III-V Semiconductors and Atom Probe Sample Preparation of Ga sensitive materials

〇Vignesh Viswanathan¹, Deying Xia², Hanfang Hao¹, John Notte² (1.Carl Zeiss Pte Ltd, 2.Carl Zeis SMT Inc.)

Sessions

Symposium » Recent progress in Advanced Ion Microscopy: Application to nano materials and devices