[13p-A303-1~9] Recent progress in Advanced Ion Microscopy: Application to nano materials and devices

▲ [13p-A303-5] Helium Ion Beam Milling for Chiral Nanostructures

〇(DC)Guenter Ellrott^1,2, Shinichi Ogawa³, Yukinori Morita³, Manoharan Muruganathan¹, Vojislav Krstic², Hiroshi Mizuta^1,4 (1.JAIST, 2.FAU, 3.AIST, 4.Hitachi Camb. Lab)

Keywords:focused ion beam, chiral, milling

Chiral 3 dimensional nanostructures have widely gained interest in physics due to their optical and electronical properties, such as circular dichroism, plasmonics and electrical Magneto Chiral Anisotropy (eMChA). To obtain these structures, various methods have been applied, from bottom up methods like chemically induced growth, self assembly and shadowing based deposition, to top down processes such as gray scale or imprint lithography.
Traditional lithographical processes combining an exposure with a subsequent wet chemical development such as optical lithography and electron beam lithography are commonly used for manufacturing of nanostructures. However, in order to minimize feature sizes, in recent years focused ion beam lithography has been widely studied as an alternative. The structures were either written and conventionally developed, or directly milled using the sputtering caused by the beam. However, the milling into surfaces is depending on the beam used and often limited to particular materials such as graphene or gold.
Here we want to report on work applying direct writing Helium Ion beam Milling (HIM) to obtain chiral 3 dimensional structures in a polymethyl-methacrylate (PMMA) layer.