[13p-D221-1~14] 6.4 Thin films and New materials

[13p-D221-7] [INVITED] Thin-film growth and characterizations of transition-metal hydrides and nitrides

〇Akira Ohtomo^1,2 (1.Tokyo Tech, 2.MCES)

Keywords:transition-metal hydrides, pulsed-laser deposition, metals

Using pulsed-laser deposition (PLD), we have investigated thin-film growth and physical properties of IV-hydrides (TiH₂, ZrH₂, HfH₂), IV-nitrides (TiN, ZrN, HfN), Ti oxynitrides, Ti oxyhydrides, CrN, and ScN. Almost all of these transition-metal compounds exhibited metallic properties. In this paper, we will describe our results on PLD growth process and some of noticeable properties for these transition-metal compounds.